Kinetic analysis of the hydrogen oxidation reaction at Nafion film covered Pt-black rotating disk electrodes

文化大學機構典藏 CCUR > 理工學院 > 工學院 > 化學工程與材料工程學系暨碩士班 > 期刊論文 > Item 987654321/2530

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題名:	Kinetic analysis of the hydrogen oxidation reaction at Nafion film covered Pt-black rotating disk electrodes
作者:	Lin, Ren-Bin Shih, Shin-Min
貢獻者:	化材系
關鍵詞:	Pt-black nation hydrogen oxidation rotating disk electrode fuel cell
日期:	2008
上傳時間:	2009-11-06 11:19:18 (UTC+8)
摘要:	The kinetics of the H2 oxidation reaction at Nafion film covered Pt-black rotating disk electrodes (RDEs) in 0.5 M H2SO4 at 298 K was investigated by varying the Pt loading, Nafion film thickness, and rotating rate. The equation describing the H2 oxidation kinetics at an RDE with a NAfion film covered porous Pt layer was derived, assuming a Tafel-Volmer mechanism and taking into account the mass transfer resistances in the aqueous electrolyte, Nafion film, and Pt layer. The H2 oxidation reaction at the Pt layer was proved to be reversible and the measurable current density was determined entirely by the mass transfer of H2 in the aqueous electrolyte and the NAfion film; the apparent kinetic current density measured was due to the experimental error. More accurate results of kinetic analysis were obtained in this work than our results reported previously. (c) 2008 Taiwan Institute of Chemical Engineers. Published by Elsevier B.V. All rights reserved.
關聯:	JOURNAL OF THE CHINESE INSTITUTE OF CHEMICAL ENGINEERS Volume: 39 Issue: 5 Pages: 475-481
顯示於類別:	[化學工程與材料工程學系暨碩士班] 期刊論文

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