文化大學機構典藏 CCUR:Item 987654321/2530
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    Please use this identifier to cite or link to this item: https://irlib.pccu.edu.tw/handle/987654321/2530


    Title: Kinetic analysis of the hydrogen oxidation reaction at Nafion film covered Pt-black rotating disk electrodes
    Authors: Lin, Ren-Bin
    Shih, Shin-Min
    Contributors: 化材系
    Keywords: Pt-black
    nation
    hydrogen oxidation
    rotating disk electrode
    fuel cell
    Date: 2008
    Issue Date: 2009-11-06 11:19:18 (UTC+8)
    Abstract: The kinetics of the H2 oxidation reaction at Nafion film covered Pt-black rotating disk electrodes (RDEs) in 0.5 M H2SO4 at 298 K was investigated by varying the Pt loading, Nafion film thickness, and rotating rate. The equation describing the H2 oxidation kinetics at an RDE with a NAfion film covered porous Pt layer was derived, assuming a Tafel-Volmer mechanism and taking into account the mass transfer resistances in the aqueous electrolyte, Nafion film, and Pt layer. The H2 oxidation reaction at the Pt layer was proved to be reversible and the measurable current density was determined entirely by the mass transfer of H2 in the aqueous electrolyte and the NAfion film; the apparent kinetic current density measured was due to the experimental error. More accurate results of kinetic analysis were obtained in this work than our results reported previously. (c) 2008 Taiwan Institute of Chemical Engineers. Published by Elsevier B.V. All rights reserved.
    Relation: JOURNAL OF THE CHINESE INSTITUTE OF CHEMICAL ENGINEERS Volume: 39 Issue: 5 Pages: 475-481
    Appears in Collections:[Department of Chemical & Materials Engineering] journal articles

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