| 摘要: | 本實驗於PMMA/玻璃纖維布膜上製作非均質抗反射結構，利用樹脂表面物理結構之改變，增進布膜之透光率。將利用氬氣電漿之蝕刻製作其結構，改變電漿功率（270、240、210w）、加工時間（30、24、18、12、6sec）、處理距離（19、5.5cm）探討其反射率與穿透率之效益。本實驗效果最佳加工參數為處理距離5.5cm、電漿功率210w、加工時間30sec，其透光率提升約2.3%。而效益最高者為處理距離5.5cm、電漿功率210w、加工時間6sec，其透光率提升約2%。兩者加工時間差異甚鉅，而透光率提升相似，並且在電漿功率210w 之條件下，各曲線近乎重疊，故本實驗利用電漿蝕刻均勻性與其加工時間之關係進行解釋。針對其餘各種加工條件搭配所產生之效果，闡述其可能性與原因，利用理論進行解釋以及比對評估其效益。
In this study, try to made non-homogeneous anti-reflective structure on the PMMA/glass-fiber. The change of the physical structure of the resin surface, increase the film’s transmittance rate. Will use the argon plasma’s etching to produce the structure, plasma power (270, 240, 210 w), time (30, 24, 18, 12, 6 sec), distance (19, 5.5 cm). Discuss the effects of reflectance and transmittance. In this study, the best parameter of process is 5.5cm, 210w, 30sec, the transmittance rate increase about 2.3%. But when the distance is 5.5cm, plasma power is 210w, time 6sec, has the highest consequent. The so different processing time of two parameters, but the increasing of transmittance’s rate is similarly. And when the plasma power is 210w, the curves almost overlap. So, in this study, try to use plasma’s etching and processing time to explain. Describe the possibility and reasons of different processing parameter’s effects, and use theory to explain and compare the effect. |
