微奈米壓印技術為現今相當熱門的一項微奈米圖案製作技術，以模具加壓於已披覆金屬或高分子薄膜之基材上或於模具上先吸附薄膜再接觸基材之方式，將模具上之圖案轉印至基材表面上。其應用相當廣泛，其中的光學薄膜上的應用受到各研發單位與產業界相當的注目，尤其是該技術可搭配捲對捲連續式製程，對於降低成本與提高量產皆有所幫助，極適合應用於軟性電子製程上，包括電子紙、可撓式顯示器、無線標籤等。也因此近年來微奈米壓印技術相關的技術成果與文獻也紛紛被發表。本文係針對微奈米壓印技術的演進與發展近況作一介紹，尤其針對光學薄膜應用；例如抗反射薄膜、微透鏡陣列、偏光片、繞射光柵等光學薄膜應用逐一作說明。
Micro/nano imprint has become a novel technique to fabricate micro- or nano-scale patterns onto the substrate. Micro/nano scale patterns of metal or polymer materials can be imprinted to the substrate surface using a mold. A wide range of applications have been developed including the optical thin films, flexible devices like E-paper, flexible displays, RFID, etc. The advantages of imprint include the compatibility with roll-to-roll processing, low cost and high throughput. In this paper, we discuss the evolution of micro/nano imprint technology and current development status. Some optical applications, such as anti-reflective, micro lens array, polarizer, grating, will also be introduced.
