本研究是以Ti、Zr、Cr、Nb熔配並製作合金靶材，再以高真空直流濺鍍機鍍製TiZrCrNb合金之初鍍膜及氮化膜，鍍膜時以氮氣為反應氣體，藉由改變氣氛中的氮氣與氬氣的比例，調整薄膜中的氮含量，探討氮含量變化對氮化膜之微結構及性質的影響。研究顯示，初鍍之TiZrCrNb薄膜經過氮化之薄膜為非晶質結構，鍍膜時間與薄膜厚度成正比關係，可知隨著濺鍍時間增加，薄膜厚度也隨之增加；而同一濺鍍時間下，膜厚與通入之氮氣流率則呈反比關係，通入之氮氣流率增加，薄膜厚度隨之下降。TiCrZrNb合金薄膜與其氮化物薄膜相較之下其表面並無太大起伏變化。氮化物薄膜之硬度及楊氏係數均較TiCrZrNb合金薄膜小，顯示氮化處理會降低TiCrZrNb合金薄膜的硬度及剛性。
The Ti, Zr, Cr, Nb elements were selected to produce the TiCrZrNb alloy target. The thin films were deposited by the high vacuum DC sputter. Nitrogen was used as the reactive gas to deposit the nitride thin films. This study regulated the percentage of nitrogen or oxygen of the films to discuss the effect of nitriding on properties of TiCrZrNb film by changing the ratio of nitrogen. All of the as-deposited thin films had an amorphous structure. The film thickness increases by increasing the deposition time. But the deposition rates of the nitride films decreased with increasing the flow rate of nitrogen. The hardness and modulus of the nitride film were smaller then as-deposited film. That meant nitriding of the thin films will reduce their hardness and rigidity.
