氧化鋅奈米線擁有豐富的優良特性，然而氧化鋅奈米線在大部分的應用上需要高度的定位成長區域，以達到良好的工作效能，因此選區成長是可以使氧化鋅奈米線進入產品化的重要因素，本研究利用微接觸微影法定義金薄膜圖形，接著以氣液固成長法選區成長垂直於基板之氧化鋅奈米線陣列，此製程方式為微接觸微影法之新穎應用，可降低選區成長垂直氧化鋅奈米線陣列之製作成本及時間消耗。
ZnO one-dimension nanostructures are possessed of excellent properties, such as mechanical, piezoelectrical, gas sensing, optical, and electrical properties. Based on these properties, However, most of these device applications require a high degree of precision regarding alignment, position, and size of the ZnO nanowires to obtain the good performance in
purpose. In this paper, we present a novel method to achieve selective growth. Using microcontact printing to define the gold catalyst patterns, the poly dimethyl siloxane (PDMS)elastomeric stamp was replicated by the master mold with cavity types. Followed by printing of self-assembled monolayers (SAM) and wet etching, the gold catalyst patterns were successfully defined on the substrates. Subsequently, ZnO nanowires were grown via vapor-liquid-solid (VLS )epitaxy mechanism catalyzed by the gold pattern to achieve selective growth. This integrated process presents the low cost method to position the ZnO one-dimension
nanostructures precisely and provides a promising way to create ZnO nanostructures for applications as two-dimensional photonic crystal, sensor arrays, and optoelectronic devices.
