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    請使用永久網址來引用或連結此文件: https://irlib.pccu.edu.tw/handle/987654321/2482


    題名: Optical properties of tungsten and titanium oxide thin films prepared by plasma sputter deposition
    作者: Huang C.C. , Tang J.C. , Tao W.H.
    貢獻者: 材料科學與奈米科技研究所
    日期: 2004
    上傳時間: 2009-11-02 11:43:31 (UTC+8)
    摘要: Tungsten oxide and titanium oxide thin films were prepared by RF reactive magnetron sputter deposition. The stationary and rotating substrate holders were applied to analyze the rotating effect. The optical properties and thicknesses of oxide films were determined by a proposed optical model and the measured transmittance spectra. The dispersed refractive indices of thin films have a wide range distribution in different sputtering conditions. In the situation of rotating substrate holder, the refractive index was lower than that of the stationary substrate holder. Also, amorphous TiO2 structure can be prepared by using rotating substrate holder. The transmittance spectrum of crystalline TiO2 reveals that the textured structure on the film surface affects the transmittance characteristic. (C) 2004 Published by Elsevier B.V.
    關聯: SOLAR ENERGY MATERIALS AND SOLAR CELLS v.83 n.1 Pages: 15-28
    顯示於類別:[化學工程與材料工程學系暨碩士班] 期刊論文

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